The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2005

Filed:

Aug. 15, 2003
Applicants:

Norbertus Benedictus Koster, Delft, NL;

Bastiaan Matthias Mertens, '-Gravenhage, NL;

Martinus Hendrikus Antonius Leenders, Rotterdam, NL;

Vladimir Vital′evitch Ivanov, Moscow, RU;

Konstantin Nikolaevitch Koshelev, Troitsk, RU;

Vadim Yevgenyevich Banine, Helmond, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/52 ; G03B027/42 ; G03B027/54 ;
U.S. Cl.
CPC ...
Abstract

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.


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