The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Oct. 23, 2001
Takashi Shigeoka, Nirasaki, JP;
Takashi Shigeoka, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of temperature measurement for measuring a temperature of an object to be measured that is heated by a heating source in a multiplex-reflection environment by using two radiation thermometers provided at a measurement part separated from the object to be measured is provided. In the method, two of the radiation thermometers have a rod that is embedded in the measurement part and can receive radiation light from the object to be measured, and an optical fiber connected to the rod; numerical apertures of the radiation thermometers are different; the multiplex-reflection environment is formed between a surface of the measurement part facing the object to be measured and the measurement part; a radiation rate ε of the object to be measured based on a result of a measurement of two of the thermometers and the temperature of the object to be measured is calculated by the following equationsα=1−(1−)ε=(1−α)·ε+α·ε/{1−·(1−ε)}wherein Drepresents a diameter of the rod of the radiation thermometers, NA represents the numerical aperture, Drepresents a distance between the object to be measured and the surface of the measurement part, r represents a reflectivity of the surface of the measurement part, F represents a view factor, α represents a multiplex reflection coefficient, εrepresents an effective radiation rate of the object to be measured, and Nand Nare parameters.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile