The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2005

Filed:

Aug. 08, 2002
Applicants:

Yoshio Homma, Hinode, JP;

Noriyuki Sakuma, Hachioji, JP;

Naofumi Ohashi, Hanno, JP;

Toshinori Imai, Ome, JP;

Inventors:

Yoshio Homma, Hinode, JP;

Noriyuki Sakuma, Hachioji, JP;

Naofumi Ohashi, Hanno, JP;

Toshinori Imai, Ome, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B001/00 ;
U.S. Cl.
CPC ...
Abstract

The apparatus and method for producing a substrate having a substrate surface by polishing the substrate surface, which includes a metallic wire. A polishing liquid is supplied a clearance between the substrate surface and the surface of a polishing pad. The polishing liquid includes an acid which dissolves the oxidized part of the substrate surface and is substantially free of solid abrasive powder. A relative movement is generated between the substrate surface and the polishing pad surface while the substrate surface is pressed against the polishing pad surface while the polishing liquid is supplied so that the dissolved oxidized part of the substrate surface can be removed from the substrate.


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