The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Nov. 20, 2002
Miyuki Matsuya, Tokyo, JP;
Hiroyoshi Kazumori, Tokyo, JP;
Miyuki Matsuya, Tokyo, JP;
Hiroyoshi Kazumori, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
Particle-beam apparatus is realized which is equipped with an aberration corrector capable of controlling the angular aperture of a particle beam after performing aberration correction. The corrector comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central stages of the electrostatic quadrupole elements, and four stages of electrostatic octupole elements for superimposing an octupole electric potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements. An objective lens is located downstream of the corrector. An objective aperture is located upstream of the corrector. An angular aperture control lens is located downstream of the objective aperture to control the angular aperture of the probe hitting a specimen surface.