The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Jun. 28, 2002
Michael Ravkin, Sunnyvale, CA (US);
John Delarios, Palo Alto, CA (US);
Afshin Nickhou, Campbell, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
James P. Garcia, Santa Clara, CA (US);
Michael Ravkin, Sunnyvale, CA (US);
John deLarios, Palo Alto, CA (US);
Afshin Nickhou, Campbell, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
James P. Garcia, Santa Clara, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A system and method for re-circulating processing fluids in a substrate processing system is provided. A fluid re-circulation system for a brush box processing tool includes a supply tank into which processing chemicals, DI water, or other processing fluids are introduced into the system from an external source. Processing chemicals are provided to the brush box and dispensed to process a substrate. Dispensed fluids drain from the brush box into a diverter through which fluids either flow to waste, or into a collection tank. Fluids from the collection tank flow into the supply tank to re-circulate for wafer processing. The re-circulation system includes filters for maintaining chemical purity, and chemical concentration is monitored and adjusted as necessary.