The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Dec. 12, 2001
Method for measuring step difference in a semiconductor device and apparatus for performing the same
Chung-sam Jun, Whasung-gun, KR;
Kye-weon Kim, Suwon-si, KR;
Yu-sin Yang, Yongin-si, KR;
Hyo-hoo Kim, Anyang-si, KR;
Chung-Sam Jun, Whasung-gun, KR;
Kye-Weon Kim, Suwon-si, KR;
Yu-Sin Yang, Yongin-si, KR;
Hyo-Hoo Kim, Anyang-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method and an apparatus for measuring a step difference in a semiconductor device without making contact with the semiconductor device. A first beam is radiated onto a wafer so as to form a first focus on a first portion of the wafer, and a second beam is radiated onto the wafer so as to form a second focus on a second portion of the wafer. The step difference between the first portion and the second portion of the wafer is measured by calculating a vertical displacement distance of the wafer and a beam focusing device used to attain the first focus and the second focus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile