The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2005

Filed:

Nov. 30, 2000
Applicants:

Masahiko Takeuchi, Hyogo, JP;

Koichiro Narimatsu, Hyogo, JP;

Atsushi Ueno, Hyogo, JP;

Inventors:

Masahiko Takeuchi, Hyogo, JP;

Koichiro Narimatsu, Hyogo, JP;

Atsushi Ueno, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23544 ;
U.S. Cl.
CPC ...
Abstract

A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.


Find Patent Forward Citations

Takeuchi, Masahiko. (2005). Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof (U.S. Patent No. 6849957). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6849957

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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