The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Mar. 22, 2002
Katsunori Ichiki, Kanagawa, JP;
Kazuo Yamauchi, Kanagawa, JP;
Hirokuni Hiyama, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Katsunori Ichiki, Kanagawa, JP;
Kazuo Yamauchi, Kanagawa, JP;
Hirokuni Hiyama, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A beam processing apparatus comprises a workpiece holder () for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (), first electrode () disposed in the vacuum chamber (), and a second electrode () disposed upstream of the first electrode () in the vacuum chamber (). The beam processing apparatus further comprises a voltage applying unit for applying a variable voltage between the first electrode () and the second electrode () to alternately extract positive ions () and negative ions from the plasma generated by the plasma generator.