The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Mar. 20, 2003
Applicant:
Matthew R. Vanhanehem, Bear, DE (US);
Inventor:
Matthew R. VanHanehem, Bear, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 100 ;
U.S. Cl.
CPC ...
Abstract
A method of reducing defectivity during chemical mechanical planarization (CMP) in a system having a wafer membrane and a retaining ring is disclosed. The method includes planarizing test wafers using different values of ring pressure and wafer pressure to determine an optimum ring pressure and wafer pressure, i.e., the ring pressure and wafer pressure that results in a reduced defectivity.