The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Sep. 25, 2003
Martijn Gerard Dominique Wehrens, Waalre, NL;
Carlo Cornelis Maria Luijten, Duizel, NL;
Martijn Gerard Dominique Wehrens, Waalre, NL;
Carlo Cornelis Maria Luijten, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system, apparatus, and method for calibrating the reticle of a lithographic system is presented herein. The method includes imaging a reticle through a lithographic system, measuring a set of height offsets based on the imaged reticle and decomposing the set of measured height offsets in accordance with a plurality of distortional factors. The invention further comprises determining the reticle stage deformation attributes based on the distortional factors and the reticle deformation attributes, and then calibrating the reticle stage based on the stage deformation attributes.