The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Nov. 05, 2002
Applicants:
Daniel J. Hoffman, Saratoga, CA (US);
Gerald Zheyao Yin, San Jose, CA (US);
Inventors:
Daniel J. Hoffman, Saratoga, CA (US);
Gerald Zheyao Yin, San Jose, CA (US);
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
B23K 902 ;
U.S. Cl.
CPC ...
Abstract
In accordance with one aspect of the invention, a plasma reactor has a capacitive electrode driven by an RF power source, and the electrode capacitance is matched at the desired plasma density and RF source frequency to the negative capacitance of the plasma, to provide an electrode plasma resonance supportive of a broad process window within which the plasma may be sustained.
Quick Actions:
Hoffman, Daniel. (2005). Plasma reactor with overhead rf electrode tuned to the plasma (U.S. Patent No. 6838635). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6838635
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile