The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2004

Filed:

May. 20, 2002
Applicant:
Inventors:

An-Chun Tu, Taipei, TW;

Wen-Fa Tai, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H01L 2/1461 ; H01L 2/1469 ; H01L 2/1306 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H01L 2/1461 ; H01L 2/1469 ; H01L 2/1306 ;
Abstract

A gas delivering device inside a gaseous reaction chamber capable of increasing gas flow in areas having a deficient supply of gas by forming additional holes in corresponding positions. Because a gas-delivering panel design having asymmetrical holes is employed, gas flow rate within the reactions chamber can be roughly balanced. Hence, a homogeneous stream of gaseous reactants can be maintained above the surface of a reacting wafer.


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