The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
Feb. 22, 2002
Applicant:
Inventors:
Ansgar Freitag, Heidenheim, DE;
Ulrich Bingel, Lauterburg, DE;
Josef Distl, Oberkochen, DE;
Uwe W. Hamm, Langenau, DE;
Assignee:
Carl Zeiss SMT AG, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/02 ; G02B 1/314 ; G03B 2/752 ;
U.S. Cl.
CPC ...
G02B 7/02 ; G02B 1/314 ; G03B 2/752 ;
Abstract
A method for reducing the contamination of at least one optical component ( ) contained in the beam guidance space ( ) and held by a frame ( ) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer ( ) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.