The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Feb. 27, 2002
Applicant:
Inventors:
Allison Holbrook, San Jose, CA (US);
Jiahua Huang, San Jose, CA (US);
Sunny Cherian, San Jose, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/26 ;
Abstract
Spacer etch trim techniques are provided. The method controllably trims a multi-film stack spacer utilizing a self-limiting etch technique. The method may use a dry etch etcher with low bias power. The dry etch process may also use other modified parameters, such as gas flows and various pressures.