The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2004

Filed:

Apr. 04, 2003
Applicant:
Inventors:

Kenji Tamamori, Kanagawa, JP;

Masato Muraki, Tokyo, JP;

Yuichi Iwasaki, Tochigi, JP;

Yoshinori Nakayama, Tokyo, JP;

Kouji Asano, Tokyo, JP;

Yoshiaki Moro, Tokyo, JP;

Masayoshi Esashi, Miyagi, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21G 5/00 ; G21K 5/10 ;
U.S. Cl.
CPC ...
G21G 5/00 ; G21K 5/10 ;
Abstract

This invention provides a reliable blanking aperture array. An insulating layer and conductive layer are sequentially formed on the lower surface of a substrate. Then, a plurality of pairs of opposing trenches are formed in the substrate, and an insulating layer is formed on each of the side surfaces of the trenches by thermal oxidation. The conductive layer is exposed by etching the bottom of each trench. A conductive member is selectively grown in each trench using the conductive layer as a plating electrode to form a blanking electrode. An opening is formed between the opposing blanking electrodes.


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