The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Mar. 04, 2002
Applicant:
Inventors:
Yaw S. Obeng, Orlando, FL (US);
Edward M. Yokley, Penbroke Pines, FL (US);
Assignee:
PsiloQuest Inc., Orlando, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/04 ; B32B 1/710 ; B32B 2/700 ; B32B 2/736 ; B32B 2/740 ;
U.S. Cl.
CPC ...
B32B 9/04 ; B32B 1/710 ; B32B 2/700 ; B32B 2/736 ; B32B 2/740 ;
Abstract
The present invention is directed, in general, to a method of planarizing a surface on a semiconductor wafer and, more specifically, to a method of altering the properties of polishing pads to improve thermal management during chemical-mechanical planarization, the resulting heat conductive pad and a polishing apparatus that includes the pad. The pad includes a polishing body composed of a thermoconductive polymer comprising an substrate and filler particle containing a Group II salt and within the substrate.