The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2004

Filed:

Sep. 10, 2002
Applicant:
Inventors:

Edward R. Fix, Boise, ID (US);

William W. Becia, Boise, ID (US);

Douglas R. Farnlund, Meridian, ID (US);

Sven Evers, Boise, ID (US);

Assignee:

Marian Corporation, Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 2/102 ;
U.S. Cl.
CPC ...
B65B 2/102 ;
Abstract

The invention relates to a wafer transfer system that achieves high efficiency, as measured by throughput rate. This is accomplished in one instance by the combination of reliable transfer of single wafers between ports while being simultaneously rotated to accomplish notch alignment. Another instance allows for simultaneous tilting of a multitude of wafers, such as changing the entire load of a transfer cassette between horizontal and vertical orientations, rather than operating on individual wafers serially. Furthermore, the design of this system renders it usable in both left-handed and right-handed workflow arrangements, not requiring construction of mirror-image systems and thereby achieving an economy of scale in production and inventory of the wafer transfer system itself.


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