The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
May. 14, 2003
Applicant:
Inventors:
Hayashi Otsuki, Nirasaki, JP;
Yutaka Miura, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 1/110 ;
U.S. Cl.
CPC ...
F16K 1/110 ;
Abstract
A process gas line ( ) for carrying WF gas for nucleation, a process gas line ( ) for carrying WF gas for film deposition after nucleation are joined at a single joint ( ) to a carrier gas line ( ). A gas line ( ) is connected to the joint ( ) to carry a mixed gas of the carrier gas and WF gas to a processing chamber defined by a processing vessel. Sections of the carrier gas line ( ) and the gas line ( ) extending on the opposite sides of the joint ( ) extend along a straight line, and the process gas lines ( ) are perpendicular to the gas line ( ).