The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Dec. 13, 2002
Akihiro Nakae, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
An exposure condition determination system and method, including a database configured to store a first information about a past exposure; and an exposure condition determination unit configured to determine an exposure condition suitable for a new mask which is newly made, based on said first information stored in said database and a second information about an exposure using said new mask. The first information includes at least one of a) a first mask information about properties of a mask used in said pas exposure; b) a first resist process information about properties of a resist process employed in said past exposure; c) an exposure condition information about an exposure condition employed in said past exposure; and d) a first aligner information about properties of an aligner.