The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Nov. 14, 2001
William N. Partlo, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Holzer K. Glatzel, San Diego, CA (US);
Raymond F. Cybulski, San Diego, CA (US);
Peter C. Newman, San Diego, CA (US);
James K. Howey, Vista, CA (US);
William G. Hulburd, San Diego, CA (US);
John T. Melchior, San Diego, CA (US);
Alex P. Ivaschenko, La Jolla, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.