The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2004

Filed:

Dec. 20, 2001
Applicant:
Inventors:

Youngmin Kim, Allen, TX (US);

Shaoping Tang, Plano, TX (US);

Seetharaman Sridhar, Richardson, TX (US);

Amitava Chatterjee, Plano, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/7082 ; H01L 2/7102 ; H01L 2/970 ;
U.S. Cl.
CPC ...
H01L 2/7082 ; H01L 2/7102 ; H01L 2/970 ;
Abstract

A pnp bipolar junction transistor is formed with improved emitter efficiency by reducing the depth of the p well implant to increase carrier concentration in the emitter and making the emitter junction deeper to increase minority lifetime in the emitter. The high gain BJT is formed without added mask steps to the process flow. A blanket high energy boron implant is used to suppress the isolation leakage in SRAM in the preferred embodiment.


Find Patent Forward Citations

Kim, Youngmin. (2004). High performance pnp bipolar device fully compatible with cmos process (U.S. Patent No. 6794730). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6794730

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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