The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2004
Filed:
Apr. 25, 2002
Makoto Takashima, Yokohama, JP;
Atsuhiko Ikeuchi, Kawasaki, JP;
Koji Hashimoto, Yokohama, JP;
Mutsunori Igarashi, Yokohama, JP;
Masaaki Yamada, Yokohama, JP;
Kabushiki Kaisha Toshiba, , JP;
Abstract
In a pattern correction method, design layout data of a pattern designed by an automated layout unit is entered. An environmental profile is determined based on whether or not another graphics pattern exists at the surroundings of each correction target cell included in the entered design layout data. A target cell name is replaced with a prescribed cell name of correction pattern corresponding to the determined environmental profile by referencing a cell replacement table. An OPC correction pattern corresponding to the replaced cell name is imported from a cell library.