The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2004
Filed:
Aug. 29, 2000
Zhiping Yin, Boise, ID (US);
Mark Jost, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
As an alternative embodiment and in connection with the reduction of the amount of ammonia in the mixture, processing conditions may be altered from conditions that are less likely to cause formation to oxide husk to conditions that are more likely. For example, processing temperatures sufficient to form passivation layer may be initiated with an ammonia-rich mixture under conditions not likely to cause formation of oxide husk . As the amount of ammonia in the mixture is reduced, processing temperatures may be increased proportionally under conditions that are more likely to cause formation of oxide husk than under conditions previously established when the amount of ammonia in the mixture is greater. The initial formation of some of passivation layer , however, resists the formation of oxide husk . Preferably, the processing temperature will be the same as the deposition temperature for ILD layer