The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2004
Filed:
Sep. 11, 2001
John H. Givens, San Antonio, TX (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Semiconductor processing methods of forming integrated circuitry are described. Embodiments provide a substrate having circuit devices. At least three layers are formed over the substrate and through which electrical connection is to be made with at least two of the circuit devices. The three layers comprise first and second layers having an etch stop layer interposed therebetween. Contact openings are formed through the three layers and a patterned masking layer is formed over the three layers to define a conductive line pattern. Material of an uppermost of the first and second layers is selectively removed, relative to the etch stop layer, to define troughs joined with the contact openings. Conductive material is subsequently formed within the joined troughs and contact openings. In some embodiment, contact openings are formed that have an aspect ratio of no less than about 10:1.