The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Sep. 27, 2001
Applicant:
Inventors:
Koji Hasegawa, Nakakubiki-gun, JP;
Takeshi Kinsho, Nakakubiki-gun, JP;
Takeru Watanabe, Nakakubiki-gun, JP;
Mutsuo Nakashima, Nakakubiki-gun, JP;
Seiichiro Tachibana, Nakakubiki-gun, JP;
Tsunehiro Nishi, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 ; C08F 3/008 ;
U.S. Cl.
CPC ...
G03F 7/039 ; C08F 3/008 ;
Abstract
A polymer bearing specific silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.