The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Oct. 12, 2001
Applicant:
Inventors:
Vincent Fortin, Santa Clara, CA (US);
Kuo-Chun Wu, San Jose, CA (US);
Assignee:
Mosel Vitelic, Inc., Hsin Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 4/900 ;
U.S. Cl.
CPC ...
B24B 4/900 ;
Abstract
In a polishing process (e.g. CMP), the endpoint is declared after (a) detecting that the friction between the polishing tool and the structure being polished is rising, then (b) determining that the friction is falling, then (c) waiting for a predetermined period of time (which can be zero). This algorithm results in reduced over-polishing in some embodiments. Other embodiments are also described.