The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Jul. 03, 2002
Chuan-Chieh Huang, Hsin-Chu, TW;
Taiwan SEmiconductor Manufacturing Co., Ltd, Hsin-Chu, TW;
Abstract
A temperature-controlled focus ring assembly for use in a plasma chamber that includes a focus ring surrounding a wafer pedestal for confining plasma ions to a top surface of a wafer positioned on the wafer pedestal; a heat transfer means in intimate contact with the focus ring for decreasing or increasing the temperature of the focus ring; and a controller for controlling the temperature of the focus ring to a predetermined value. The invention further discloses a method for operating a plasma chamber equipped with a temperature-controlled focus ring assembly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile