The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Jun. 24, 2003
Isao Ochiai, Otsuki, JP;
Toshiei Kurosaki, Hitachinaka, JP;
Toshiro Kubo, Hitachinaka, JP;
Naomasa Suzuki, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.