The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2004

Filed:

Jul. 05, 2001
Applicant:
Inventors:

Shui-Hung Chen, Hsin-chu, TW;

Jian-Hsing Lee, Hsin-chu, TW;

Jiaw-Ren Shih, Hsin-chu, TW;

Ta-Lee Yu, Hsin-chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/974 ; H01L 2/362 ;
U.S. Cl.
CPC ...
H01L 2/974 ; H01L 2/362 ;
Abstract

A new electrostatic discharge protection device is achieved. A p-well region is in a semiconductor substrate. An n+ region in the p-well region is connected to a first voltage supply. An n-well region in the p-well region is spaced from the n+ region such that a depletion region will extend therebetween during normal operation. A p+ region in the n-well region is connected to a second voltage supply of greater value than the first voltage supply during normal operation. Current is conducted through the n+ region to the p+ region during an electrostatic discharge event.


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