The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Apr. 17, 2003
Applicant:
Inventors:
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
A process for the fabrication of a ferrocapacitor comprising depositing a first mask element over a structure having a bottom electrode , a ferroelectric layer and a top electrode . RIE etching is performed to remove portions of the top electrode and the ferroelectric layer . Then a second hard mask element is deposited over the first hardmask element. The second hard mask element is rounded by an etch back process, and its taper angle is controlled to be in the range 75-87°. A second RIE etching process is performed to remove portions of the bottom electrode . Due to the rounding of the second hard mask elements low residues are formed on the sides of the etched bottom electrode