The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2004

Filed:

Jan. 16, 2002
Applicant:
Inventors:

Khoi A. Phan, San Jose, CA (US);

Jeffrey Erhardt, San Jose, CA (US);

Jerry Cheng, Milpistas, CA (US);

Richard J. Bartlett, Bonny Doon, CA (US);

Anthony P. Coniglio, San Jose, CA (US);

Wolfram Grundke, Dresden, DE;

Carol M. Bradway, Austin, TX (US);

Daniel E. Sutton, Austin, TX (US);

Martin Mazur, Pulsnitz, DE;

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 ; G03F 7/30 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/20 ; G03F 7/30 ; G03F 7/40 ;
Abstract

Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein, including special vapor prime and development operations.


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