The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2004
Filed:
Jul. 06, 2001
Applicant:
Inventors:
Wouter Onno Pril, Eindhoven, NL;
Philip Dennis Henshaw, Carlisle, MA (US);
Engelbertus Antonius Fransiscus Van De Pasch, Oirschot, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
Abstract
A lithographic projection apparatus which uses one, and optionally also two or more color interferometric devices to accurately determine the position of a movable table within the apparatus. The apparatus comprises a purge gas source to supply purge gas to a space accommodating at least a part of said movable table, the purge gas being selected such that leakage of the purge gas into the area of operation of the interferometric devices does not cause significant error in the interferometric measurements.