The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2004
Filed:
Jul. 12, 2001
Jun Ozawa, Yamanashi-Ken, JP;
Jun Hirose, Yamanashi-Ken, JP;
Eiji Hirose, Yamanashi-Ken, JP;
Hiroshi Koizumi, Yamanashi-Ken, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A vacuum treatment device, comprising a vacuum treatment chamber ( ) etching a semiconductor wafer (W) as a body to be treated and a preliminary vacuum chamber ( ) communicating with the vacuum treatment chamber ( ), wherein a transfer arm ( ) and first and second buffers ( ) for temporarily supporting the wafer (W) are installed in the preliminary vacuum chamber ( ), the transfer arm ( ) is provided with a flexible arm part ( ) and a support part ( ) supporting the wafer (W), the arm part ( ) is extended and retracted by the rotations of a drive side swing arm ( ) and a driven side swing arm ( ) forming the arm ( ) so as to move the support part ( ) straight forward and backward while maintaining it in its attitude, and the first and second buffers ( ) are disposed on the motion route of the support part ( ) of the transfer arm ( ).