The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2004

Filed:

Apr. 28, 2003
Applicant:
Inventors:

Kwang-hee Lee, Seoul, KR;

Sung-tae Kim, Seoul, KR;

Cha-young Yoo, Kyungki-do, KR;

Han-jin Lim, Seoul, KR;

Wan-don Kim, Kyungki-do, KR;

Se-hoon Oh, Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract

A lower electrode is formed from a first metal on a semiconductor substrate. Atoms of a second metal, that is different than the first metal, are diffused into the lower electrode. A dielectric layer is formed on the lower electrode, and an upper electrode is formed on the dielectric layer. Diffusion of second metal atoms into the lower electrode may reduce or prevent crystal grain growth and agglomeration on a surface of the lower electrode during a subsequent high temperature process.


Find Patent Forward Citations

Lee, Kwang-hee. (2004). Methods for manufacturing semiconductor memory devices (U.S. Patent No. 6743678). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6743678

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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