The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Aug. 16, 2002
Applicant:
Inventors:
Mutsuo Nakashima, Nakakubiki-gun, JP;
Seiichiro Tachibana, Nakakubiki-gun, JP;
Takeru Watanabe, Nakakubiki-gun, JP;
Takeshi Kinsho, Nakakubiki-gun, JP;
Koji Hasegawa, Nakakubiki-gun, JP;
Tsunehiro Nishi, Nakakubiki-gun, JP;
Jun Hatakeyama, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 ; C07D / ;
U.S. Cl.
CPC ...
G03C 5/00 ; C07D / ;
Abstract
Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.