The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
May. 21, 2002
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A rotary substrate processing apparatus includes a rotor having a holding member for holding a plurality of semiconductor wafers W arranged at appropriate intervals and a motor for rotating the rotor . The holding member includes open/close holding rods that are moved to open or close the rotor in inserting the wafers W into the rotor sideways and a plurality of constant-position holding rods to for holding the wafers W in cooperation with the open/close holding rods . Among the constant-position holding rods to , at least one constant-position holding rod is equipped with a plurality of press members which move toward respective peripheral portions of the wafers W by centrifugal force due to the rotation of the rotor . Consequently, it becomes possible to make the wafers W follow the rotation of the rotor ensurely and also possible to reduce slip between the open/close holding rods , the constant-position holding rods to and the wafers W. Therefore, it is possible to accomplish both improvement in processing efficiency for the substrates and reduction in abrasion amount of the holding member and also possible to increase a life span of the apparatus.