The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Sep. 27, 1999
Applicant:
Inventors:
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ;
Abstract
According to one embodiment ( ), a method of forming a self-aligned contact can include forming adjacent conducting structures with sidewalls ( ). A first insulating layer may then be formed without first forming a liner ( ), such as a liner that is conventionally formed to protect underlying conducting structures and/or a substrate. A contact hole may then be etched between adjacent conducting structures ( ). Contact structures may then be formed ( ).