The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Jan. 17, 2002
Timothy J. Dalton, Ridgefield, CT (US);
Minakshisundaran B. Anand, Germantown, MD (US);
Michael D. Armacost, San Jose, CA (US);
Shyng-Tsong Chen, Patterson, NY (US);
Stephen M. Gates, Ossining, NY (US);
Stephen E. Greco, LaGrangeville, NY (US);
Simon M. Karecki, late of Brooklyn, NY (US);
Satyanarayana V. Nitta, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is described for forming a metal pattern in a low-dielectric constant substrate. A hardmask is prepared which includes a low-k lower hardmask layer and a top hardmask layer. The top hardmask layer is a sacrificial layer with a thickness of about 200 Å, preferably formed of a refractory nitride, and which serves as a stopping layer in a subsequent CMP metal removal process. The patterning is performed using resist layers. Oxidation damage to the lower hardmask layer is avoided by forming a protective layer in the hardmask, or by using a non-oxidizing resist strip process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile