The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2004

Filed:

Dec. 20, 2001
Applicant:
Inventors:

Sijbe Abraham Van Der Lei, Veldhoven, NL;

Marnix Aldert Tas, Eindhoven, NL;

Jan Hoegee, Eindhoven, NL;

Paul Van Der Veen, Eindhoven, NL;

Jess Koehler, Oberkochen, DE;

Johannes Wangler, Koenigsbronn, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 7/04 ; G02B 6/00 ; G09F 1/300 ;
U.S. Cl.
CPC ...
F21V 7/04 ; G02B 6/00 ; G09F 1/300 ;
Abstract

An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the same material is arranged before the entrance surface of the rod. The aspect ratio between width and height of the small rods is the inverse of the aspect ratio between width and height of the rod. The rod arrangement, or some analogous structure, surface or treatment substituted therefor, serves to compensate the direction-dependent total reflection losses of the rod.


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