The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Jun. 18, 2001
Applicant:
Inventors:
Mohamed Kamel Amara, Dover, DE (US);
Noureddine Melikechi, Dover, DE (US);
Sabbir M. Mian, Westminster, MD (US);
Assignee:
Applied Optics Center of Delaware, Inc., Dover, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01H 2/100 ; G01H 2/141 ; G01B 1/128 ;
U.S. Cl.
CPC ...
G01H 2/100 ; G01H 2/141 ; G01B 1/128 ;
Abstract
A beam deflection technique for simultaneous measurements of the thickness, refractive index and optical absorption of transparent materials using a charge coupled device (CCD) camera is provided. The method comprises measuring beam deflection after transmission through or reflection off a sample of interest at variable incidence angles to the sample surface. The measurement of beam deflection as a function of incident angle is related through Snell's Law directly to the sample thickness and sample index of refraction.