The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 04, 2004

Filed:

Sep. 07, 2000
Applicant:
Inventor:

Hideaki Amano, Zama, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 ; C23C 1/6511 ;
U.S. Cl.
CPC ...
H05H 1/46 ; C23C 1/6511 ;
Abstract

The vacuum processing chambers of the plasma processing units A and B are connected to the transfer chamber and the wafer W in the positioned state is transferred from the transfer chamber to the mounting stages in the vacuum processing chambers . The volume and length of the wave guide are the same between the plasma processing units A and B. The location relationship of the wave guide to the transfer directions M and M of the transfer arm is the same between the plasma processing units A and B. As a result, the location relationship of the wave guide to the wafer W mounted on the mounting stage in a predetermined direction is the same between the plasma processing units A and B.


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