The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Nov. 17, 1999
Applicant:
Inventors:
Edward Yeh, San Jose, CA (US);
Olivier Laparra, San Jose, CA (US);
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/13205 ; H01L 2/14763 ; H01L 2/144 ;
U.S. Cl.
CPC ...
H01L 2/13205 ; H01L 2/14763 ; H01L 2/144 ;
Abstract
A method is presented for forming a transistor gate structure. A gate oxide layer is formed. Gate material is deposited on the gate oxide layer. A layer of silicon oxynitride is deposited on the gate material. The layer of silicon oxynitride, the gate material and the gate oxide layer are etched to form a gate structure. A silicon oxynitride region remains on top of the gate structure. A wet chemical process is performed to remove the silicon oxynitride region from the top of the gate structure. After performing the wet chemical process, spacers are formed around the gate structure.