The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2004
Filed:
Mar. 27, 2002
Applicant:
Inventors:
Jenn-Kuen Leong, Cupertino, CA (US);
Guoheng Zhao, Milpitas, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
Assignee:
KLA-Tencor Technologies Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract
A method and system of using exposure control to inspect a surface, such as a wafer. One inspection system comprises charge coupled devices (CCDs) as detectors. The exposure control function of each CCD is used to adjust integration times on individual taps of the CCD such that light scattered from the surface, which may contain multiple scattering regions, is within a dynamic range of the CCD during inspection.