The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
Aug. 09, 2002
Takashi Terauchi, Hyogo, JP;
Akinobu Teramoto, Hyogo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
A semiconductor device having a structure in which the amount of stress on a semiconductor substrate or a gate wire is low, even in a case when the sidewalls of the gate wire are formed of a nitride film is obtained. A gate conductive layer positioned above a silicon substrate, a stress mitigating film that covers a sidewall of the gate conductive layer and a sidewall external layer spacer that covers the stress mitigating film and that exposes the upper edge of the stress mitigating film and the side edge of the bottom portion of the stress mitigating film are provided and the stress mitigating film has silicon oxide films positioned in the areas ranging inwardly from the upper edge and from the side edge so as to sandwich the silicon oxide film from both ends.