The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2004
Filed:
May. 09, 2000
Kazuhiko Hayashi, Tokyo, JP;
Keishi Ohashi, Tokyo, JP;
Nobuyuki Ishiwata, Tokyo, JP;
Masafumi Nakada, Tokyo, JP;
Eizo Fukami, Tokyo, JP;
Kiyokazu Nagahara, Tokyo, JP;
Hiroaki Honjo, Tokyo, JP;
Shinsaku Saitoh, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
In a production process of an MR head using the tunnel junction film basically consisting of a free layer, a barrier layer, and a pinned layer, the resistance between the free layer and the pined layer reduced beforehand and increased afterward up to a resistance value necessary when actually used. While the resistance between the free layer and the pinned layer is low, current can easily flow, suppressing charge up, thus preventing insulation destruction of the barrier layer. This significantly increases a production yield of a recording/reproduction head using a ferromagnetic tunnel junction element.