The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Sep. 06, 2002
Applicant:
Inventors:
Raashina Humayun, San Jose, CA (US);
Patrick Christopher Joyce, Fremont, CA (US);
Vishal Gauri, San Jose, CA (US);
Adrianne Kay Tipton, Fremont, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 ;
U.S. Cl.
CPC ...
B08B 7/04 ;
Abstract
A supercritical process vessel with an interior for holding a supercritical fluid is provided. A wafer support for supporting a wafer within the interior of a supercritical process vessel to expose the wafer to the supercritical fluid is provided. A lamp, which is able to operate at supercritical fluid pressures within the interior of the supercritical process vessel is provided.
Humayun, Raashina. (2004). Method and apparatus for radiation enhanced supercritical fluid processing (U.S. Patent No. 6715498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6715498
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile