The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Apr. 03, 2003
Tzu-Ching Tsai, Taichung Hsien, TW;
Hui Min Mao, Tainan Hsien, TW;
Ying Huan Chuang, Taoyuan Hsien, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
Method for forming buried plates. The method includes providing a substrate formed with a pad stacked layer on the surface, a bottle trench and a protective layer on the upper sidewalls of the bottle trench, forming a doped hemispherical silicon grain (HSG) layer on the protective layer and the sidewalls and bottom of the bottle trench, removing the hemispherical silicon grain layer on the protective layer without removing the hemispherical silicon grain layer from the lower sidewalls and bottom of the bottle trench, forming a covering layer on the protective layer, and subjecting the doped hemispherical silicon grain layer to drive-in annealing so that ions in the HSG layer diffuse out to the substrate, thereby forming a buried plate within the lower sidewalls of the bottle trench.