The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2004

Filed:

May. 23, 2003
Applicant:
Inventors:

John Zheng Ye, Brighton, MA (US);

Victor M. Benveniste, Gloucester, MA (US);

Michael Paul Cristoforo, Beverly, MA (US);

Assignee:

Axceliss Technologies, Inc, Beverly, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/7317 ;
U.S. Cl.
CPC ...
H01J 3/7317 ;
Abstract

Ion implantation systems and beamline assemblies therefor are provided, in which multi-cusped magnetic fields are provided in a beamguide and the beamguide is energized to provide microwave electric fields in a traveling wave along the beamguide passageway. The magnetic and electric fields interact to provide an electron-cyclotron resonance condition for beam containment in the beamguide passageway.


Find Patent Forward Citations

Ye, John. (2004). Method and system for ion beam containment in an ion beam guide (U.S. Patent No. 6703628). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6703628

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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