The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2004
Filed:
Aug. 10, 2001
Lu-Chang Chen, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A gaseous supply system and method for operating the same is disclosed for supplying at least one gaseous source material to an ion source chamber for use with an ion implanter including at least one gas supply module in gaseous communication with an ion source chamber including at least one pneumatic valve to control the delivery of at least one gaseous source material to the ion source chamber for generation of source material ions for implantation including a driver gas source in communication with said at least one pneumatic valve for operating the at least one pneumatic valve said driver gas source having a different atomic mass unit than the source material ions for implantation generated from the at least one gaseous source material.