The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Apr. 19, 2002
Applicant:
Inventors:
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1336 ;
U.S. Cl.
CPC ...
H01L 2/1336 ;
Abstract
A method ( ) of fabricating a semiconductor device. An oxide layer ( ) is produced on a sidewall ( ) of a stacked gate ( ) and over a shallow trench ( ) adjacent to the stacked gate. The thickness of the oxide layer is sufficient to withstand a subsequent etch. A first layer ( ) of material is deposited over the oxide layer. In a first etch, the first layer is reduced to a first thickness along the sidewall. Because the oxide layer has a depth sufficient to withstand the first etch, the oxide layer serves as a protective layer for the shallow trench during the first etch. Accordingly, a protective liner layer does not need to be deposited in addition to the oxide layer.